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Dielectric properties of soft chemical method derived CaCu3Ti4O12 thin films onto Pt/TiO2/Si(100) substrates

机译:在Pt / TiO2 / Si(100)衬底上用软化学方法获得的CaCu3Ti4O12薄膜的介电性能

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摘要

Calcium copper titanate, CaCu3Ti4O12 (CCTO), thin film has been deposited by the soft chemical method on Pt/Ti/SiO2/Si (1 0 0) substrates at 700 degrees C for 2 h. The peaks were indexed as cubic phase belonging to the Im-3 space group. The film exhibited a duplex microstructure consisting of large grains of 130 nm in length and regions of fine grains (less than 80 nm). The CCTO film capacitor showed a dielectric loss of 0.031 and a dielectric permittivity of 1020 at 1 MHz. The J-V behavior is completely symmetrical, regardless of whether the conduction is limited by interfacial barriers or by bulk-like mechanisms. Based on impedance analyses, the equivalent circuit of CCTO film consisting of a resistor connected in series with two resistor-capacitor (RC) elements. (C) 2011 Elsevier B.V. All rights reserved.
机译:钛酸铜钙CaCu3Ti4O12(CCTO)薄膜已通过软化学方法在700℃下于Pt / Ti / SiO2 / Si(1 0 0)衬底上沉积了2 h。峰被索引为属于Im-3空间群的立方相。该膜显示出由长度为130 nm的大晶粒和细晶粒(小于80 nm)区域组成的双相微观结构。 CCTO薄膜电容器在1 MHz下的介电损耗为0.031,介电常数为1020。 J-V行为是完全对称的,而不管传导是否受到界面势垒或块状机制的限制。根据阻抗分析,CCTO薄膜的等效电路包括一个电阻,该电阻与两个电阻-电容(RC)元件串联。 (C)2011 Elsevier B.V.保留所有权利。

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